GENESIS offers a full line of photoresist products based on  it's revolutionary VOC Free waterborne platform chemistry.

AQ 3000 is a waterbased, VOC Free etch resist used in the manufacture of printed circuit boards, flexible circuits, thin film circuits, hybrid circuits and MEMs. Applied by roller coating, dip coating, spin coating or spray coating, these photoresists offer sub 25 micron resolution capabilities. The fast dry times and ultra fast-photospeed makes Laser Direct Imaging of liquid photoresist a reality.

AQ 2000 is a waterbased, VOC Free soldermask used in the manufacture of printed circuit boards, flexible circuits, thin film and hybrid circuits.

GENESIS offers a full line of photoresist products based on  it's revolutionary VOC Free waterborne platform chemistry.

AQ 3000 is a waterbased, VOC Free etch resist used for chemical milling, photoengraving and photoetching. Applied by roller coating, dip coating, spin coating or spray coating, these photoresists offer sub 25 micron resolution capabilities. The advanced chemistry provides high resistance to etchants in both thin and deep etch environments. The fast dry times and ultra fast-photospeed improve productivity.